AVS International Symposium and Exhibition to attract over 2000 participants

October 4, 2011

The AVS 58th International Symposium and Exhibition will be held at the Nashville Convention Center in Nashville, TN, USA, from October 30 to November 4, 2011. 

The organisers of the week-long event, the American Vacuum Society, state that the symposium will address cutting-edge issues associated with materials, processing, and interfaces in both the research and manufacturing communities.

More than 2,000 scientists and engineers are expected to gather from around the world to attend the event, with the accompanying equipment exhibition being one of the largest in the world. Entry to the exhibition is free of charge and provides an opportunity to view the latest products and services offered by over 200 participating companies.

Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies.

The comprehensive technical programme, with over 1400 presentations, can be searched on the event website, and includes papers on the following subjects:

  • Advanced Surface Engineering
  • Applied Surface Science

  • Biomaterial Interfaces
  • Electronic Materials & Processing
  • Magnetic Interfaces & Nanostructures
  • Manufacturing Science & Technology
  • MEMS & NEMS
  • Nanometer-scale Science & Technology
  • Plasma Science & Technology
  • Surface Science
  • Thin Film
  • Vacuum Technology


For more information visit www.avs.org   

Edited by: Paul Whittaker, Editor ipmd.net, [email protected]   

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