Plansee to present Powder Metallurgy sputtering targets at vacuum and thin-film technology seminar

January 24, 2018

January 24, 2018

Dr Jӧrg Winkler, Head of Development Display and Solar at Plansee, Breitenwang, Austria, will deliver a presentation on ‘Sputtering targets manufactured using Powder Metallurgy for use in thin-film technology” at a vacuum and thin-film technology seminar, taking place February 26-27, 2018 in Regensburg, Germany.

Hosted by the Haus der Technik (HDT) the seminar will address the fundamental technical/physical background to vacuum and thin-film technology. Over the course of the two-day event, experts from a number of companies will present and discuss the key methods (PVD, CVD), systems and components needed to operate vacuum and thin-film systems.

Delegates will gain insight into the function and operation of vacuum pumps, measuring systems, power supply units and a variety of thin-film processes with a focus on practical application. A range of vacuum components, vacuum parts and coating materials will also be addressed, with the opportunity to discuss not only the technical aspects but also the cost and efficiency of the systems.

In his presentation, Plansee’s Winkler will highlight some of the key requirements that apply to sputtering targets and arc cathodes:

  • What quality characteristics need special attention to achieve a stable coating process?
  • How is it possible to produce thin films with a high level of film thickness uniformity and a high deposition rate?
  • What are the special considerations when bonding the coating source?
  • What are the trends in technology and materials?

Further information on the seminar program, location and registration are available via the organiser’s website.


January 24, 2018

In the latest issue of PM Review…

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