Indium Corp exhibits new Powder Metallurgy copper-gallium sputtering targets at InterSolar North America
July 26, 2011
Indium Corp based in Clinton, New York, USA, recently exhibited its newly developed copper-gallium sputtering targets at the InterSolar North America 2011 exhibition held in San Francisco (July 12-14).
The sputtering targets are made by Indium Corp’s vertically integrated, proprietary powder metallurgy technology, which the company states results in a consistently homogeneous alloy with low levels of contamination.
The Cu-Ga targets can be produced in chemistry ranges from 50% to 80% copper (atomic wt%) with gallium making up the balance of the alloy. Both are produced as a monolithic material, bonded onto a backing tube.
The company’s unique hybrid consolidation process is said to result in uniform density throughout the targets which in turn results in very consistent sputtering film properties when applied for copper indium gallium diselenide (CIGS) thin-film photovoltaic applications.
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